KEVIN.MURPHY

YOUNG.AGAIN Masque 200 ml

Intensivkur

Water (Aqua) (Eau), Cetearyl Alcohol, Cyclopentasiloxane, Polysorbate 60, Behentrimonium Chloride, Panthenol, Tocopherol, Tocopheryl Acetate, Ascorbic Acid, Helichrysum Italicum Extract, Nelumbo Nucifera Flower Extract, Phalaenopsis Amabilis Extract, Bambusa Vulgaris Leaf/Stem Extract, Adansonia Digitata Seed Oil, Hydrolyzed Quinoa, Cocodimonium Hydroxypropyl Hydrolyzed Rice Protein, Glutamic Acid, Tyrosine, Arginine, Aspartic Acid, Glycine, Alanine, Serine, Valine, Proline, Threonine, Isoleucine, Phenylalanine, Histidine, Leucine, Sodium PCA, Lecithin, Asparagine, Cysteine, Glutamine, Tryptophan, Sodium Lactate, PCA, Silk Amino Acids, Camellia Sinensis Leaf Extract, Lycium Barbarum Fruit Extract, Centella Asiatica Extract, Mangifera Indica (Mango) Seed Butter, Cocos Nucifera (Coconut) Oil, Carthamus Tinctorius (Safflower) Seed Oil, Glycine Soja (Soybean) Oil, Magnesium Aspartate, Glycerin, Jojoba Alcohol, Jojoba Esters, Hydrolyzed Keratin, Isopropyl Alcohol, Dicaprylyl Carbonate, Cetrimonium Chloride, Amodimethicone, Panthenyl Hydroxypropyl Steardimonium Chloride, Trimethylsiloxyamodimethicone, Palmitoyl Tripeptide-5, Zinc Gluconate, Copper Gluconate, Isopropyl Jojobate, C11-15 Pareth-7, C12-16 Pareth-9, Lauryl Glucoside, Trideceth-12, Stearamidopropyl Dimethylamine, Polyquaternium-37, Ethylhexyl Methoxycinnamate, Polysilicone-15, Tetrasodium Glutamate Diacetate, Sodium Glycolate, BHT, Phenoxyethanol, Ethylhexylglycerin, Chlorphenesin, Sorbic Acid, Benzoic Acid, Potassium Sorbate, Sodium Benzoate, Lactobacillus Ferment, Leuconostoc/Radish Root Ferment Filtrate, Sodium Formate, Citric Acid, Sodium Hydroxide, Fragrance (Parfum), Linalool, Limonene, Benzyl Alcohol

Die aufgeführten Inhaltsstoffe entsprechen dem aktuellen Stand der Produktion. Es fließen regelmäßig neue wissenschaftliche Erkenntnisse in die Rezepturen mit ein, wodurch sich die Formulierungen entsprechend ändern können. Maßgeblich sind daher die Inhaltsstoffe auf dem Produkt oder auf der Verpackung.